Research Areas

Main Research Areas: Plasma chemistry - solid state chemistry, kinetics and mechanisms (mass spectroscopy, laser induced fluorescence and spectroscopy); plasma CVD and PVD, OM CVD (Ge, Si, heteroepitaxy of 3C-SiC), chemical transport and epitaxy; plasma etching; plasma-surface interaction in fusion devices. Surface analytics XPS, AES, ISS, STM) surface chemistry in plasmas; Restoration and conservation of archeological artifacts; nc light emitting Si and Ge; Optical properties of organosilicon molecules; Superhard nanocomposites.